Duke engineers show how a common device architecture used to test 2D transistors overstates their performance prospects in real-world devices.
For example, Intel introduced “Tri-Gate” transistors at the 22 nm node (~2012), becoming one of the first companies to use FinFETs in their CPUs. Soon, all leading chip manufacturers (TSMC, Samsung, ...
A field effect transistor (FET) is a carrier device with three terminals: source, drain, and gate. In FETs, an electric field can be applied at the terminal of the gate, modifying the conductive ...
Advanced Micro Devices has developed two sets of next-generation transistors using different approaches that produce higher levels of performance than conventional transistors, the company said at the ...
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